Description
This application integrates five core computing functions, including resolution, depth of focus, numerical aperture, exposure dose, and linewidth control. Based on professional theoretical models such as Rayleigh criterion, DOF formula, NA calculation, exposure dose formula, and linewidth error control, it helps users quickly and accurately complete key parameter calculations in photolithography processes. The application adopts an intuitive card style interface design, supporting multiple interaction methods such as sliders, stepper, and segmented controllers. It has practical functions such as historical recording and unit conversion, and provides tactile feedback and dark mode adaptation to ensure that users can obtain a smooth and professional user experience in various environments. It is an indispensable technical tool in the field of photolithography technology.